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Hosseinizadeh P, Malekmohammad F, Malekmohammad M. Fabrication of single anti-reflection layer by introducing porous structure on silicon substrate by using chemical etching. ICOP & ICPET _ INPC _ ICOFS 2018; 24 :497-500
URL: http://opsi.ir/article-1-1642-en.html
URL: http://opsi.ir/article-1-1642-en.html
1- Science faculty, Physics department, Esfahan University
Abstract: (2283 Views)
Metal assisted chemical etching (MACE) method is an effective process for the fabrication of single anti-reflection layer at room temperature. Nanostructures on silicon substrate with different immersion coating time and different etching time have been fabricated. The reflection on porous surface with coating and etching time of 40s and 5h respectively, in spectral range of 400-5000 nanometer have been achieved lower than 2.1%. Therefore, the structure of single anti-reflection layer in wide spectral range can be obtained through low cost and without advanced equipment at room temperature, that is used in many optic systems and solar cells to increase efficiency and performance.
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